US 12,330,260 B2
Polishing pad with secondary window seal
Rajkumar Alagarsamy, Sunnyvale, CA (US); Yongqi Hu, Fremont, CA (US); Simon Yavelberg, Cupertino, CA (US); Periya Gopalan, San Jose, CA (US); and Christopher R. Mahon, San Bruno, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Apr. 3, 2023, as Appl. No. 18/295,250.
Application 18/295,250 is a continuation of application No. 16/987,206, filed on Aug. 6, 2020, granted, now 11,618,124.
Application 16/987,206 is a continuation of application No. 15/676,882, filed on Aug. 14, 2017, granted, now 10,744,618, issued on Aug. 18, 2020.
Application 15/676,882 is a continuation of application No. 14/594,661, filed on Jan. 12, 2015, granted, now 9,731,397, issued on Aug. 15, 2017.
Application 14/594,661 is a continuation of application No. 13/839,899, filed on Mar. 15, 2013, granted, now 8,961,266, issued on Feb. 24, 2015.
Prior Publication US 2023/0278158 A1, Sep. 7, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. B24B 37/22 (2012.01); B24B 37/20 (2012.01); B24B 49/12 (2006.01)
CPC B24B 37/205 (2013.01) [B24B 37/20 (2013.01); B24B 37/22 (2013.01); B24B 49/12 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A polishing pad for a chemical mechanical polishing apparatus, comprising:
a polishing article having an upper layer with a polishing surface, a lower portion, and an aperture formed through the polishing article, the aperture including a first section adjacent the polishing surface and through the upper layer and a second section adjacent the first section and through the lower portion, wherein the lower portion forms a projection extending inwardly into the aperture beyond an edge of the upper layer such that the second section is narrower than the first section, the projection having an upper surface substantially parallel to the polishing surface;
a window having a top surface substantially parallel to and coplanar with the polishing surface, a second portion aligned with the second section of the aperture and having a bottom surface with a recess that is narrower than the second section of the aperture, and a first portion extending outwardly from the second portion over the projection from the polishing article;
a first adhesive adhering an upper surface of the projection to a bottom of the first portion of the window; and
a second adhesive of different material composition than the first adhesive, the second adhesive positioned laterally between the second portion of the window and the projection.