CPC H01L 31/0463 (2014.12) [H01L 31/022425 (2013.01); H01L 31/0322 (2013.01)] | 23 Claims |
1. A method of patterning a thin-film photovoltaic layer stack comprising:
providing a continuous layer stack, the layer stack comprising a substrate, a first electrode layer on the substrate and a photovoltaic layer on the first electrode layer;
immersing the layer stack into an electrically conductive solution;
applying a bias voltage between the electrically conductive solution and the first electrode layer;
selectively removing the photovoltaic layer along a first line and forming a first trench in the photovoltaic layer before or after immersing the layer stack into the electrically conductive solution; and
converting a first material or a first material composition provided in at least a first portion of the layer stack into a first reaction product by an electrochemical reaction, wherein the first reaction product has an electrical conductivity that is lower than an electrical conductivity of the first material or the first material composition,
wherein the first material or the first material composition of the first portion of the layer stack comprises Molybdenum (Mo), and wherein the first reaction product comprises MoOx, with 2.5<x≤3.
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