US 12,009,243 B2
Overlay measurement device and method, and system and program therefor
Sol-Lee Hwang, Hwaseong-si (KR); Hee-Chul Lim, Hwaseong-si (KR); Dong-Won Jung, Hwaseong-si (KR); Min-Ho Lee, Hwaseong-si (KR); and Hyun-Kyoo Shon, Hwaseong-si (KR)
Assigned to AUROS TECHNOLOGY, INC., Hwaseong-si (KR)
Filed by AUROS TECHNOLOGY, INC., Hwaseong-si (KR)
Filed on Jul. 28, 2023, as Appl. No. 18/227,652.
Claims priority of application No. 10-2022-0133289 (KR), filed on Oct. 17, 2022.
Prior Publication US 2024/0128112 A1, Apr. 18, 2024
Int. Cl. H01L 21/68 (2006.01)
CPC H01L 21/681 (2013.01) 17 Claims
OG exemplary drawing
 
1. An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer, the overlay measurement device comprising:
a light source;
a beam splitter that splits a beam from the light source into two beams;
a spectrum filter for adjusting a central wavelength and a bandwidth of the beam split by the beam splitter to obtain the first overlay mark image or the second overlay mark image;
a detector for obtaining the first overlay mark image or the second overlay mark image;
a transmission and receipt part; and
a processor connecting to the transmission and receipt part electrically,
wherein the processor is configured to:
obtain data transmitted from a user terminal through the transmission and receipt part,
analyze a recipe included in the data,
perform optimization of measurement options of a wafer, based on the recipe, after the recipe is analyzed,
measure the spectrum filter once with a filter wheel to calculate statistical values in relation to a plurality of parameters for each filter on the filter wheel, and
assign weights respectively to the calculated statistical values, and perform a filter optimization process selecting a filter having a minimum sum of the statistical values to which the weights is assigned respectively, as the spectrum filter.