US 12,009,192 B2
System for coupling RF power into LINACs and bellows coating by magnetron sputtering with kick pulse
Thomas J. Houlahan, Jr., Urbana, IL (US); Daniel P. Menet, Urbana, IL (US); Ian F. Haehnlein, Champaign, IL (US); Ivan A. Shchelkanov, Pleasanton, CA (US); Robert A. Stubbers, Savoy, IL (US); and Brian E. Jurczyk, Champaign, IL (US)
Assigned to Starfire Industries LLC, Champaign, IL (US)
Filed by Starfire Industries LLC, Champaign, IL (US)
Filed on May 17, 2021, as Appl. No. 17/322,600.
Application 17/322,600 is a continuation in part of application No. 16/848,353, filed on Apr. 14, 2020, granted, now 11,008,650.
Application 16/848,353 is a continuation in part of application No. 16/801,002, filed on Feb. 25, 2020.
Application 16/848,353 is a continuation in part of application No. 16/006,357, filed on Jun. 12, 2018, granted, now 11,069,515.
Application 16/848,353 is a continuation in part of application No. 15/803,320, filed on Nov. 3, 2017, granted, now 10,624,199, issued on Apr. 14, 2020.
Claims priority of provisional application 63/139,609, filed on Jan. 20, 2021.
Claims priority of provisional application 62/810,230, filed on Feb. 25, 2019.
Claims priority of provisional application 62/518,362, filed on Jun. 12, 2017.
Claims priority of provisional application 62/416,900, filed on Nov. 3, 2016.
Prior Publication US 2021/0327694 A1, Oct. 21, 2021
Int. Cl. H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01)
CPC H01J 37/3467 (2013.01) [C23C 14/3485 (2013.01); C23C 14/35 (2013.01); H01J 37/3405 (2013.01); H01J 37/3417 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A method, carried out by a system, for depositing high-quality films for providing a nanolayered coating on a three-dimensional surface, wherein the system comprises:
a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target; and
an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target, and
wherein the method for comprises nanolayering a surface of a three-dimensional surface by generating and controlling ion flux for direct current high-power impulse magnetron sputtering, and
wherein the nanolayering a surface comprises:
providing a vacuum apparatus containing a sputtering magnetron target electrode;
generating a high-power pulsed plasma magnetron discharge with a high-current negative direct current (DC) pulse to the sputtering magnetron target electrode; and
generating a configurable sustained positive voltage kick pulse to the sputtering magnetron target electrode after terminating the negative DC pulse,
wherein during the generating, program processor configured logic circuitry issues a control signal to control at least one kick pulse property of the sustained positive voltage kick pulse taken from the group consisting of: onset delay, duration, amplitude and frequency including modulation thereof, and
wherein, during the nanolayering, a distance (L) between the sputtering magnetron target electrode and a receiving surface of the three-dimensional surface is a distance such that the system operates in an abnormal or obstructed glow discharge regime.