CPC H01J 37/32935 (2013.01) [H01J 37/32082 (2013.01); H01J 37/32926 (2013.01)] | 9 Claims |
1. A plasma processing system, comprising:
a plasma processing apparatus including a processing chamber for plasma processing an object to be processed, and at least one component which is at least partially disposed in the processing chamber;
a storage unit for storing a recipe including a set value specifying a plasma processing condition;
a tolerance determination unit that determines a tolerance of the set value, based on a degree of deterioration of the at least one component; and
a recipe modification unit that modifies the recipe such that the set value falls within the tolerance, when the set value is outside the tolerance.
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