CPC H01J 37/32862 (2013.01) [B08B 9/00 (2013.01); B08B 13/00 (2013.01); H01J 2237/334 (2013.01)] | 6 Claims |
1. A rotatable faraday cleaning apparatus for a plasma processing system, comprising:
a reactor cavity main body;
a bias electrode mounted at a lower side inside the reactor cavity main body; and
a rotatable cleaning mechanism disposed at an upper side above the reactor cavity main body,
wherein the rotatable cleaning mechanism comprises:
a cavity cover assembled at the upper side above the reactor cavity main body,
a coupling window mounted at an upper side of the cavity cover,
a gas intake nozzle provided at a central part of the coupling window,
a long-petalled assembly and a short-petalled assembly assembled at an outer side of the gas intake nozzle,
a first sector-shaped conductor and a second sector-shaped conductor assembled at the outer side of the gas intake nozzle,
a connecting rod assembled at a left side of the long-petalled assembly,
an eccentric wheel assembled at a front side of the connecting rod, and
a motor mounted at an upper side of the eccentric wheel.
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