CPC G03F 9/7046 (2013.01) [G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 7/70683 (2013.01)] | 20 Claims |
1. A method for determining a layout of mark positions across a patterning device or substrate, the method comprising:
obtaining a computer model configured to model data associated with measurements performed on the patterning device or substrate at one or more mark positions;
obtaining an initial mark layout comprising initial mark positions;
reducing the initial mark layout by removal of one or more mark positions to obtain a plurality of reduced mark layouts, each reduced mark layout obtained by removal of a different mark position from the initial mark layout;
determining a model uncertainty metric associated with usage of the computer model for each reduced mark layout out of the plurality of reduced mark layouts; and
selecting one or more reduced mark layouts based on the model uncertainty metric associated with the plurality of reduced mark layouts.
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