US 12,006,568 B2
Vapor deposition device
Kazuhide Matsumoto, Tokyo (JP); and Hsin-Tsai Wang, Taipei (TW)
Assigned to THERMALYTICA, INC., Tsukuba (JP)
Appl. No. 17/596,571
Filed by THERMALYTICA, INC., Tsukuba (JP)
PCT Filed Mar. 18, 2020, PCT No. PCT/JP2020/011904
§ 371(c)(1), (2) Date Dec. 13, 2021,
PCT Pub. No. WO2021/186604, PCT Pub. Date Sep. 23, 2021.
Prior Publication US 2022/0228254 A1, Jul. 21, 2022
Int. Cl. C23C 14/50 (2006.01); C23C 14/35 (2006.01); C23C 14/56 (2006.01)
CPC C23C 14/505 (2013.01) [C23C 14/35 (2013.01); C23C 14/564 (2013.01)] 7 Claims
OG exemplary drawing
 
1. Vapor deposition device for forming a ceramic coating on a substrate, comprising a coating chamber, a loading chamber, and a substrate support, wherein:
the coating chamber and the loading chamber are connected individually to a vacuumizer and are connected to each other at their opening in the left-right direction;
inside the coating chamber are provided a raw material holder that supports a ceramic raw material and an electron gun that irradiates the ceramic raw material with an electron beam;
the substrate support includes a left partition wall and a right partition wall, and also includes a left substrate support plate, multiple substrates being mountable thereon, to the left side of the left partition wall and a right substrate support plate, another set of multiple substrates being mountable thereon, to the right side of the right partition wall, the substrate support is configured to move horizontally in the left-right direction between a vapor deposition position at which one of the left and right partition walls is in close contact with the wall surface around the opening and a reverse position at which none of the left and right partition walls is in contact with the wall surface, is configured to rotate the left substrate support plate in a plane parallel to the left partition wall, is configured to rotate the mounted multiple substrates around a mounting portion, and is configured to rotate the right substrate support plate in a plane parallel to the right partition wall and
the substrate support is further configured to reverse its position such that the other of the left and right partition walls is facing the opening.