US 12,006,566 B2
Composite tungsten oxide film and method for producing same, and film-deposited base material and article each provided with said film
Keiichi Sato, Tokyo (JP); and Isao Ando, Tokyo (JP)
Assigned to SUMITOMO METAL MINING CO., LTD., Tokyo (JP)
Appl. No. 17/252,936
Filed by SUMITOMO METAL MINING CO., LTD., Tokyo (JP)
PCT Filed Jun. 6, 2019, PCT No. PCT/JP2019/022481
§ 371(c)(1), (2) Date Dec. 16, 2020,
PCT Pub. No. WO2019/244650, PCT Pub. Date Dec. 26, 2019.
Claims priority of application No. 2018-117340 (JP), filed on Jun. 20, 2018; and application No. 2019-024926 (JP), filed on Feb. 14, 2019.
Prior Publication US 2021/0147973 A1, May 20, 2021
Int. Cl. C23C 14/08 (2006.01); C01G 41/00 (2006.01); C03C 17/245 (2006.01); C23C 14/34 (2006.01); C23C 14/58 (2006.01)
CPC C23C 14/083 (2013.01) [C01G 41/006 (2013.01); C03C 17/245 (2013.01); C23C 14/3414 (2013.01); C23C 14/5806 (2013.01); C01P 2002/54 (2013.01); C01P 2002/74 (2013.01); C01P 2002/76 (2013.01); C01P 2006/40 (2013.01); C01P 2006/60 (2013.01); C01P 2006/90 (2013.01); C03C 2218/154 (2013.01); C03C 2218/32 (2013.01)] 21 Claims
OG exemplary drawing
 
1. A composite tungsten oxide film comprising a composition represented by a general formula MxWyOz, wherein an element M is one or more elements selected from alkaline metal, alkaline earth metal, Fe, In, Tl, and Sn, an element W is tungsten, and an element O is oxygen, as a main component,
wherein 0.001≤x/y≤1, 2.2≤z/y≤3.0,
wherein a particle dispersion and organic components are not contained substantially in the composition, and
wherein the composite tungsten oxide film is sputtered and heat treated, wherein the sputtered and heat treated composite tungsten oxide film has a transmittance in a wavelength of 550 nm of 50% or more, a transmittance in a wavelength of 1400 nm of 30% or less, and a reflectance in a wavelength of 1400 nm of 35% or more.