US 12,005,687 B2
Thin glass substrate, method and apparatus for its production
Armin Vogl, Jena (DE); Thomas Schmiady, Jena (DE); Thilo Zachau, Neuengoenna (DE); Jochen Alkemper, Klein-Winternheim (DE); Michael Meister, Mainz (DE); Christian Kunert, Wiesbaden (DE); Lutz Klippe, Wiesbaden (DE); and Rüdiger Dietrich, Jena (DE)
Assigned to SCHOTT AG, Mainz (DE)
Filed by SCHOTT AG, Mainz (DE)
Filed on Feb. 21, 2023, as Appl. No. 18/171,925.
Application 18/171,925 is a division of application No. 16/450,692, filed on Jun. 24, 2019, granted, now 11,890,844.
Application 16/450,692 is a continuation of application No. PCT/EP2017/083554, filed on Dec. 19, 2017.
Claims priority of application No. 10 2016 125 488.6 (DE), filed on Dec. 22, 2016; and application No. 10 2017 124 625.8 (DE), filed on Oct. 20, 2017.
Prior Publication US 2023/0191741 A1, Jun. 22, 2023
Int. Cl. B32B 3/26 (2006.01); B32B 3/02 (2006.01); B32B 3/30 (2006.01); B32B 17/00 (2006.01); B32B 17/10 (2006.01); C03B 17/06 (2006.01); C03B 18/02 (2006.01); C03B 23/023 (2006.01); C03C 3/04 (2006.01); C03C 3/083 (2006.01); C03C 3/087 (2006.01); C03C 3/093 (2006.01); C03C 21/00 (2006.01)
CPC B32B 3/263 (2013.01) [B32B 3/02 (2013.01); B32B 3/26 (2013.01); B32B 3/30 (2013.01); B32B 17/10036 (2013.01); B32B 17/10045 (2013.01); B32B 17/10119 (2013.01); B32B 17/10137 (2013.01); C03B 17/064 (2013.01); C03B 18/02 (2013.01); C03B 23/023 (2013.01); C03C 3/083 (2013.01); C03C 3/087 (2013.01); C03C 3/093 (2013.01); C03C 21/002 (2013.01); B32B 2315/08 (2013.01); B32B 2329/04 (2013.01); B32B 2329/06 (2013.01); B32B 2551/00 (2013.01); B32B 2571/00 (2013.01); B32B 2605/006 (2013.01); Y10T 428/24777 (2015.01)] 11 Claims
OG exemplary drawing
 
1. A glass substrate, comprising:
a glass having first and second main surfaces; and
elongated elevations on one of the first and second main surfaces, the elongated elevations substantially rising in a normal direction, having a longitudinal extent that is greater than two times a transverse extent, and having a height, on average, that is less than 100 nm, and with a transverse extent of the elevation smaller than 40 mm.