US 12,005,389 B1
Retrofittable dry media abatement reactor
Justin Weinstein, Clifton Park, NY (US); and Kimberly E. Konar, Stillwater, NY (US)
Assigned to GlobalFoundries U.S. Inc., Malta, NY (US)
Filed by GlobalFoundries U.S. Inc., Malta, NY (US)
Filed on Oct. 2, 2023, as Appl. No. 18/479,346.
Int. Cl. B01D 53/04 (2006.01); B01D 53/40 (2006.01); B01D 53/82 (2006.01); H01L 21/67 (2006.01)
CPC B01D 53/0446 (2013.01) [B01D 53/0423 (2013.01); B01D 53/40 (2013.01); B01D 53/82 (2013.01); B01D 2253/102 (2013.01); B01D 2258/0216 (2013.01); B01D 2259/4145 (2013.01); H01L 21/67017 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system comprising:
an abatement apparatus having at least one of a combustion chamber and a water-based chamber configured to abate an emission stream from a semiconductor manufacturing process;
a vacuum pump coupled to the abatement apparatus and configured to transmit the emission stream from the semiconductor manufacturing process through the abatement apparatus; and
a media canister coupled to the vacuum pump and configured to abate the emission stream in response to an abatement fault in the abatement apparatus, wherein the media canister comprises:
a reaction chamber having an inlet configured to receive the emission stream, and
a dry media disposed within the reaction chamber and configured to abate the emission stream therein.