CPC B01D 53/0446 (2013.01) [B01D 53/0423 (2013.01); B01D 53/40 (2013.01); B01D 53/82 (2013.01); B01D 2253/102 (2013.01); B01D 2258/0216 (2013.01); B01D 2259/4145 (2013.01); H01L 21/67017 (2013.01)] | 20 Claims |
1. A system comprising:
an abatement apparatus having at least one of a combustion chamber and a water-based chamber configured to abate an emission stream from a semiconductor manufacturing process;
a vacuum pump coupled to the abatement apparatus and configured to transmit the emission stream from the semiconductor manufacturing process through the abatement apparatus; and
a media canister coupled to the vacuum pump and configured to abate the emission stream in response to an abatement fault in the abatement apparatus, wherein the media canister comprises:
a reaction chamber having an inlet configured to receive the emission stream, and
a dry media disposed within the reaction chamber and configured to abate the emission stream therein.
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