US 12,005,218 B2
Devices and methods for warm gas therapy
Maruthy Kalburgi Narayanasa, Bengaluru (IN); Ram Mohan Rao, Bengaluru (IN); Sanjay Seetharama Sharma, Bengaluru (IN); Arunkumar Venkatesan, Bengaluru (IN); and Vinayaka Nandalike Padmanabha, Bengaluru (IN)
Assigned to YOSTRA LABS PVT LTD, Karnataka (IN)
Appl. No. 16/637,232
Filed by Yostra Labs Pvt Ltd, Bengaluru (IN)
PCT Filed Aug. 8, 2018, PCT No. PCT/IN2018/050518
§ 371(c)(1), (2) Date Feb. 6, 2020,
PCT Pub. No. WO2019/030774, PCT Pub. Date Feb. 14, 2019.
Claims priority of application No. 201741028213 (IN), filed on Aug. 8, 2017.
Prior Publication US 2020/0230387 A1, Jul. 23, 2020
Int. Cl. A61M 35/00 (2006.01); A61H 33/06 (2006.01); A61H 33/14 (2006.01); A61M 1/00 (2006.01)
CPC A61M 35/30 (2019.05) [A61H 33/063 (2013.01); A61H 33/14 (2013.01); A61M 1/90 (2021.05); A61H 2033/061 (2013.01); A61H 2033/141 (2013.01); A61H 2033/143 (2013.01); A61H 2201/0228 (2013.01); A61H 2201/105 (2013.01); A61H 2201/1642 (2013.01); A61H 2201/5007 (2013.01); A61H 2201/5043 (2013.01); A61H 2201/5082 (2013.01); A61M 2202/0208 (2013.01); A61M 2202/0216 (2013.01); A61M 2205/18 (2013.01); A61M 2205/3368 (2013.01); A61M 2205/362 (2013.01); A61M 2205/3653 (2013.01); A61M 2205/50 (2013.01); A61M 2210/086 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A device for delivery of warm therapeutic gas, the device comprising:
a gas warmer assembly to warm a first gas to a temperature in a first temperature range to obtain a warm first gas, wherein the gas warmer assembly comprises:
a heater to warm the first gas to the temperature in the first temperature range; and
a microprocessor to control the heater;
a first delivery unit coupled to the gas warmer assembly to deliver the warm first gas received from the gas warmer assembly to a main treatment chamber;
a second delivery unit configured to receive a therapeutic gas from a gas supply, wherein the second delivery unit comprises:
a first portion that substantially passes through the first delivery unit, wherein the warm first gas warms the therapeutic gas in the first portion to obtain a warm therapeutic gas; and
a second portion configured to deliver the warm therapeutic gas to a sub-treatment chamber;
wherein the main treatment chamber is associated with a first sensor to measure and communicate a main treatment chamber temperature to the microprocessor; and
wherein the sub-treatment chamber is configured to enclose a site for treatment, wherein the main treatment chamber encloses the sub-treatment chamber to retain heat in the sub-treatment chamber, and wherein the sub-treatment chamber is associated with a second sensor to measure and communicate a sub-treatment chamber temperature to the microprocessor.