| CPC H10N 60/805 (2023.02) [G06N 10/40 (2022.01); H10N 60/0912 (2023.02); H10N 60/12 (2023.02)] | 11 Claims |

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1. A method for preparing a superconducting circuit, comprising:
covering a first area with a first photoresist and covering a second area with a second photoresist, wherein the first area comprises an area where a superconducting qubit of the superconducting circuit is located, the second area comprises an area where a part of the superconducting circuit is located, and the second photoresist covers the first photoresist;
performing lithography on the second photoresist to form the part of the superconducting circuit, and to expose the first photoresist covered by the second photoresist;
performing lithography on the exposed first photoresist to form the superconducting qubit;
depositing a superconducting material on the first area and the second area; and
removing the first photoresist and the second photoresist to obtain the superconducting circuit, wherein the superconducting qubit and the part of the superconducting circuit are connected via a superconducting layer formed by the deposited superconducting material.
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