US 12,327,815 B2
Integrated circuit package and method of forming the same
Der-Chyang Yeh, Hsinchu (TW); Sung-Feng Yeh, Taipei (TW); and Jian-Wei Hong, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Aug. 5, 2022, as Appl. No. 17/817,738.
Prior Publication US 2024/0047417 A1, Feb. 8, 2024
Int. Cl. H01L 25/065 (2023.01); H01L 23/00 (2006.01); H01L 25/00 (2006.01)
CPC H01L 25/0652 (2013.01) [H01L 24/08 (2013.01); H01L 24/80 (2013.01); H01L 25/50 (2013.01); H01L 2224/08145 (2013.01); H01L 2224/80006 (2013.01); H01L 2224/80895 (2013.01); H01L 2224/80896 (2013.01); H01L 2225/06541 (2013.01); H01L 2225/06586 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method comprising:
attaching a first die and a second die to a first wafer, the first wafer comprising:
a first carrier substrate; and
a first interconnect structure comprising first dielectric layers and first conductive features embedded in the first dielectric layers;
encapsulating the first die and the second die in a first encapsulant;
attaching a third die to the first die and a fourth die to the second die, the third die being electrically connected to the first die, the fourth die being electrically connected to the second die;
encapsulating the third die and the fourth die in a second encapsulant;
attaching a second wafer to the third die and the fourth die, the second wafer comprising:
a second carrier substrate; and
a second interconnect structure comprising second dielectric layers and second conductive features embedded in the second dielectric layers;
removing the first carrier substrate;
patterning the first dielectric layers to expose conductive features of the first die and the second die; and
forming external connectors through the first dielectric layers, the external connectors being electrically connected to corresponding ones of the conductive features of the first die and the second die.