US 12,327,737 B2
Substrate treating apparatus
Jun Sawashima, Kyoto (JP); Takahiro Yamaguchi, Kyoto (JP); Toshimitsu Namba, Kyoto (JP); and Sei Negoro, Kyoto (JP)
Assigned to SCREEN Holdings Co., Ltd., (JP)
Filed by SCREEN Holdings Co., Ltd., Kyoto (JP)
Filed on Feb. 22, 2022, as Appl. No. 17/676,900.
Claims priority of application No. 2021-030445 (JP), filed on Feb. 26, 2021; and application No. 2021-099296 (JP), filed on Jun. 15, 2021.
Prior Publication US 2022/0277966 A1, Sep. 1, 2022
Int. Cl. H01L 21/67 (2006.01); H01L 21/673 (2006.01)
CPC H01L 21/67023 (2013.01) [H01L 21/673 (2013.01)] 27 Claims
OG exemplary drawing
 
1. A substrate treating apparatus comprising:
a first treating housing for treating substrates in an interior thereof; and
a first gas supply unit for supplying a gas to the interior of the first treating housing;
wherein the first gas supply unit includes:
a filter disposed in an upper part of the first treating housing for blowing off the gas to the interior of the first treating housing;
a duct disposed in an exterior of the first treating housing and connected to the filter; and
a fan disposed in the exterior of the first treating housing and connected to the duct;
the fan being located in a position not overlapping the filter in plan view;
at least part of the fan being located in a same height position as the first treating housing.