US 12,327,720 B2
Method of processing substrate, substrate processing apparatus, recording medium, and manufacturing semiconductor device
Toshiyuki Kikuchi, Toyama (JP); and Naofumi Ohashi, Toyama (JP)
Assigned to KOKUSAI ELECTRIC CORPORATION, Tokyo (JP)
Filed by KOKUSAI ELECTRIC CORPORATION, Tokyo (JP)
Filed on Sep. 15, 2021, as Appl. No. 17/476,035.
Claims priority of application No. 2021-054496 (JP), filed on Mar. 29, 2021.
Prior Publication US 2022/0310386 A1, Sep. 29, 2022
Int. Cl. H01L 21/02 (2006.01); H01L 21/677 (2006.01)
CPC H01L 21/02274 (2013.01) [H01L 21/0217 (2013.01); H01L 21/0234 (2013.01); H01L 21/67703 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A method of processing a substrate, comprising:
receiving type information, which includes processing time information of a plurality of predetermined processes, for substrate processing that includes the plurality of predetermined processes;
reading the type information and the processing time information corresponding to the type information from a memory;
calculating a ratio of a processing time for each of the predetermined processes to a total time of the plurality of predetermined processes based on the processing time information;
selecting a set of one or more reactors among a plurality of reactors according to the ratio for one among the plurality of predetermined processes;
setting the selected set of one or more reactors to be capable of performing the one among the plurality of predetermined processes;
transferring substrates corresponding to the type information to the selected set of one or more reactors; and
performing the one of the plurality of predetermined processes corresponding to the type information in the selected set of one or more reactors,
wherein a processing history of the plurality of predetermined processes performed in each of the plurality of reactors is recorded in the memory, and
wherein in the act of selecting the set of one or more reactors, the set of one or more reactors is selected according to the processing history.
 
18. A method of manufacturing a semiconductor device, comprising:
receiving type information, which includes processing time information of a plurality of predetermined processes, for substrate processing that includes the plurality of predetermined processes;
reading the type information and the processing time information corresponding to the type information from a memory;
calculating a ratio of a processing time for each of the plurality of predetermined processes to a total time of the plurality of predetermined processes based on the processing time information;
selecting a set of one or more reactors among a plurality of reactors according to the ratio for each of the plurality of predetermined processes;
setting the selected set of one or more reactors to be capable of performing each of the plurality of predetermined processes;
transferring substrates corresponding to the type information to the selected set of one or more reactors; and
performing each of the plurality of predetermined processes corresponding to the type information in the selected set of one or more reactors,
wherein a processing history of the plurality of predetermined processes performed in each of the plurality of reactors is recorded in the memory, and
wherein in the act of selecting the set of one or more reactors, the set of one or more reactors is selected according to the processing history.