US 12,327,714 B2
Plasma generation quality monitoring using multi-channel sensor data
Jeremy Smith, San Mateo, CA (US); Tao Zhang, San Ramon, CA (US); Vivek Bharat Shah, Santa Clara, CA (US); John Poulose, San Jose, CA (US); and Ghadeh Hadi, Santa Clara, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on May 2, 2023, as Appl. No. 18/142,546.
Prior Publication US 2024/0371617 A1, Nov. 7, 2024
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/3299 (2013.01) [H01J 37/32926 (2013.01); H01J 37/32935 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method, comprising:
obtaining, by a processing device, a measurement of a calibrated feedback control device of a process chamber;
determining, by the processing device, a first indication of performance of a plasma generating apparatus of the process chamber based on the measurement of the calibrated feedback control device;
obtaining, from a first sensor of the process chamber, a second indication of performance of the plasma generating apparatus;
providing the first indication of performance of the plasma generating apparatus and the second indication of performance of the plasma generating apparatus to a plasma monitoring module;
obtaining, from the plasma monitoring module, a combined indication of performance of the plasma generating apparatus; and
performing, in view of the combined indication of performance of the plasma generating apparatus, a corrective action.