US 12,327,713 B2
Plasma reactor for inductively coupled plasma and method of assembling the same
Jin Ho Bae, Hwaseong-si (KR); Min Jae Kim, Ansan-si (KR); Geon Bo Sim, Osan-si (KR); and Tae Wook Yoo, Seoul (KR)
Assigned to LOT CES CO., LTD., Osan-si (KR); and LOT VACUUM CO., LTD., Osan-si (KR)
Filed by LOT CES CO., LTD., Osan-si (KR); and LOT VACUUM CO., LTD., Osan-si (KR)
Filed on Jul. 8, 2024, as Appl. No. 18/766,571.
Application 18/766,571 is a continuation of application No. 17/918,103, granted, now 12,062,528, previously published as PCT/KR2021/005044, filed on Apr. 21, 2021.
Claims priority of application No. 10-2020-0058137 (KR), filed on May 15, 2020.
Prior Publication US 2024/0363316 A1, Oct. 31, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32844 (2013.01) [H01J 37/321 (2013.01); H01J 37/32807 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A plasma reactor for inductively coupled plasma comprising:
a ferrite core assembly comprising a ferrite core stacked body including a plurality of ferrite cores stacked and a first passage portion and a second passage portion arranged in parallel, and a ferrite core accommodating structure configured to accommodate the ferrite core stacked body;
a first chamber body comprising a first A-extension pipe accommodated in the first passage portion, and a second A-extension pipe accommodated in the second passage portion; and
a second chamber body comprising a first B-extension pipe accommodated in the first passage portion to be connected to the first A-extension pipe, and a second B-extension pipe accommodated in the second passage portion to be connected to the second A-extension pipe.