| CPC H01J 37/32568 (2013.01) [H01J 37/32348 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01); H01J 37/32522 (2013.01); H01J 2237/002 (2013.01); H01J 2237/038 (2013.01)] | 6 Claims |
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1. An active gas generation apparatus generating active gas obtained by activating material gas supplied to a discharge space, comprising:
a first electrode constituting part; and
a second electrode constituting part provided on a lower side of the first electrode constituting part, wherein
the first electrode constituting part includes a first electrode dielectric film and a first metal electrode formed on an upper surface of the first electrode dielectric film, the second electrode constituting part includes a second electrode dielectric film and a second metal electrode formed on a lower surface of the second electrode dielectric film, AC voltage is applied to the first metal electrode, the second metal electrode is set to ground potential, and a dielectric space where the first and second electrode dielectric films face each other includes a region where the first and second metal electrodes overlap with each other in a plan view as the discharge space, and
the second electrode dielectric film includes a gas ejection hole for ejecting the active gas to a lower side, and a path from the discharge space to the gas ejection hole is defined as an active gas transmission path,
the active gas generation apparatus further comprising
a base flange having conductivity, having a cross-section structure with a concave shape, and including a central bottom surface region and a peripheral protruding part provided along an outer periphery of the central bottom surface region to protrude in a height direction, wherein the second electrode constituting part is provided so that the second metal electrode has contact with the central bottom surface region,
the active gas generation apparatus further comprising:
a conductive structure with conductivity provided on the peripheral protruding part of the base flange and located above an upper side of the first electrode constituting part without having contact with the first electrode constituting part;
an insulating material provided between the conductive structure and the first electrode constituting part, having an upper surface having contact with a lower surface of the conductive structure, and having a lower surface having contact with the upper surface of the first metal electrode;
an electrode support member provided on the lower surface of the conductive structure to support the first electrode constituting part from a lower side; and
a metal housing provided on the peripheral protruding part of the base flange and having an in-housing space housing the conductive structure, wherein
the base flange includes:
a gas supply port receiving the material gas from outside;
a gas transmission path for supplying the material gas to the discharge space; and
a base flange gas ejection hole for ejecting the active gas ejected from the gas ejection hole to a lower side,
ground potential is supplied to the base flange,
provided is a gas separation structure of separating a gas flow between the in-housing space and the discharge space by the conductive structure, the electrode support member, and the first electrode constituting part,
the active gas generation apparatus further comprising
a third metal electrode provided on an upper surface of the first electrode dielectric film independently from the first metal electrode, wherein
the third metal electrode is provided to partially overlap with a part of the active gas transmission path in a plan view and set to ground potential.
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