US 12,326,666 B2
Exposing apparatus and method for manufacturing article
Takashi Hayakawa, Tochigi (JP); and Keiji Emoto, Saitama (JP)
Assigned to Canon Kabushiki Kaisha, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Jul. 26, 2021, as Appl. No. 17/385,752.
Claims priority of application No. 2020-127585 (JP), filed on Jul. 28, 2020.
Prior Publication US 2022/0035260 A1, Feb. 3, 2022
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70725 (2013.01) 12 Claims
OG exemplary drawing
 
1. An exposing apparatus for exposing a substrate so as to transfer a pattern formed on an original to the substrate by using exposure light from a light source, comprising:
a substrate stage on which the substrate is mounted;
a projecting optical system configured to project an image of the pattern onto the substrate;
a driving unit configured to drive the substrate stage in a first direction perpendicular to an optical axis of the projecting optical system and a second direction perpendicular to the optical axis and the first direction, the driving unit including a first actuator configured to apply a first thrust in the first direction to a first side of the substrate stage, a second actuator configured to apply a second thrust in the first direction to a second side, opposite to the first side, of the substrate stage, a third actuator configured to apply a third thrust in the second direction to a third side of the substrate stage, and a fourth actuator configured to apply a fourth thrust in the second direction to a fourth side, opposite to the third side, of the substrate stage; and
a controller configured to control the driving unit such that the substrate stage is moved to expose a plurality of shot regions on the substrate by performing a first drive in the first direction with the first actuator and the second actuator, and a second drive in the second direction with the third actuator and the fourth actuator,
wherein the controller causes the first actuator to apply the first thrust to the first side in a first orientation of the first direction and causes the second actuator to apply the second thrust to the second side in a second orientation opposite to the first orientation of the first direction to move the substrate stage in the first direction, and
wherein the controller controls the driving unit such that a total thrust of the first thrust and the second thrust changes according to a sine function by changing each of the first thrust and the second thrust, and any of a magnitude of the first thrust and a magnitude of the second thrust does not become 0 when an orientation of the total thrust changes in the first drive.