US 12,326,483 B2
Magnetic multi-turn sensor structures and fabrication
Jan Kubik, Limerick (IE); Jochen Schmitt, Biedenkopf (DE); and Onur Necdet Urs, Hamburg (DE)
Assigned to Analog Devices International Unlimited Company, Limerick (IE)
Filed by Analog Devices International Unlimited Company, Limerick (IE)
Filed on Jan. 20, 2023, as Appl. No. 18/157,282.
Claims priority of provisional application 63/304,279, filed on Jan. 28, 2022.
Prior Publication US 2023/0243897 A1, Aug. 3, 2023
Int. Cl. G01R 33/00 (2006.01); G01R 33/09 (2006.01)
CPC G01R 33/0052 (2013.01) [G01R 33/093 (2013.01); G01R 33/098 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of manufacturing a closed-loop magnetic multi-turn sensor, the method comprising:
forming a substrate;
forming, over the substrate, a magnetic film layer;
forming, over a first photoresist material layer applied to the magnetic film layer, a first mask layer having a first pattern;
exposing the first photoresist material layer;
forming, over a second photoresist material layer and over the first mask layer, a second mask layer having a second pattern;
aligning the second mask layer with the first mask layer such that the first pattern and the second pattern together form a cross shape of the magnetic film layer; and
exposing the second photoresist material layer.