US 12,326,407 B2
Inspection apparatus and inspection method
Nitish Kumar, Eindhoven (NL); Richard Quintanilha, Heidenheim an der Brenz (DE); Markus Gerardus Martinus Maria Van Kraaij, Eindhoven (NL); Konstantin Tsigutkin, Eindhoven (NL); and Willem Marie Julia Marcel Coene, Geldrop (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on May 23, 2023, as Appl. No. 18/200,947.
Application 18/200,947 is a continuation of application No. 16/963,905, granted, now 11,692,948, previously published as PCT/EP2019/050306, filed on Jan. 8, 2019.
Claims priority of application No. 18154116 (EP), filed on Jan. 30, 2018.
Prior Publication US 2023/0296533 A1, Sep. 21, 2023
Int. Cl. G01N 21/956 (2006.01); G02F 1/35 (2006.01); G03F 1/84 (2012.01)
CPC G01N 21/956 (2013.01) [G02F 1/353 (2013.01); G03F 1/84 (2013.01); G01N 2021/95676 (2013.01); G01N 2201/06113 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of inspection for detecting a defect on a substrate for or of a reflective reticle, wherein the substrate is configured to be illuminated by radiation having an actinic wavelength to expose an object with a pattern of the reticle, the method comprising:
performing a coarse inspection using a first inspection radiation having one or more first wavelengths within a first wavelength range between 20 nm and 150 nm; and
performing a fine inspection using a second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range and comprising the actinic wavelength.