US 12,325,915 B2
Substrate processing apparatus and method
Timo Vähä-Ojala, Masala (FI); Väinö Kilpi, Masala (FI); Niklas Holm, Masala (FI); and Timo Malinen, Masala (FI)
Assigned to Picosun Oy, Espoo (FI)
Appl. No. 17/779,181
Filed by Picosun Oy, Espoo (FI)
PCT Filed Nov. 25, 2020, PCT No. PCT/FI2020/050793
§ 371(c)(1), (2) Date May 24, 2022,
PCT Pub. No. WO2021/105560, PCT Pub. Date Jun. 3, 2021.
Claims priority of application No. 20196029 (FI), filed on Nov. 28, 2019.
Prior Publication US 2022/0403514 A1, Dec. 22, 2022
Int. Cl. C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/54 (2006.01)
CPC C23C 16/45536 (2013.01) [C23C 16/4408 (2013.01); C23C 16/4412 (2013.01); C23C 16/45517 (2013.01); C23C 16/4583 (2013.01); C23C 16/545 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A substrate processing apparatus, comprising:
a reaction chamber to process a roll-to-roll substrate, or a substrate supported by a substrate support;
a photon source to provide the reaction chamber with photons from the top side of the reaction chamber;
a chemical inlet to provide the reaction chamber with a reactive chemical;
a chemical outlet to exhaust gases from the reaction chamber, the chemical outlet separating the reaction chamber from a surrounding space, and
a window in between the photon source and the reaction chamber allowing said photons to pass through, the apparatus being further configured to provide a purge flow to purge a reaction chamber side of the window,
wherein the chemical inlet is positioned between the chemical outlet and the location where the purge flow is configured to be introduced to the reaction chamber.