US 12,325,911 B2
Method and apparatus for forming a patterned layer of material
Tamara Druzhinina, Eindhoven (NL); Jim Vincent Overkamp, Eindhoven (NL); Alexey Olegovich Polyakov, Veldhoven (NL); Teis Johan Coenen, Vught (NL); Evgenia Kurganova, Nijmegen (NL); Ionel Mugurel Ciobica, Eindhoven (NL); Alexander Ludwig Klein, Eindhoven (NL); Albertus Victor Gerardus Mangnus, Eindhoven (NL); Marijke Scotuzzi, Eindhoven (NL); and Bastiaan Maurice Van Den Broek, Sprang-Capelle (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/600,493
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Mar. 20, 2020, PCT No. PCT/EP2020/057781
§ 371(c)(1), (2) Date Sep. 30, 2021,
PCT Pub. No. WO2020/207759, PCT Pub. Date Oct. 15, 2020.
Claims priority of application No. 19168949 (EP), filed on Apr. 12, 2019; application No. 19178048 (EP), filed on Jun. 4, 2019; and application No. 19215592 (EP), filed on Dec. 12, 2019.
Prior Publication US 2022/0213593 A1, Jul. 7, 2022
Int. Cl. C23C 16/00 (2006.01); C23C 16/26 (2006.01); C23C 16/48 (2006.01); C23C 16/56 (2006.01); G03F 1/22 (2012.01); G03F 7/00 (2006.01); H01L 21/285 (2006.01)
CPC C23C 16/26 (2013.01) [C23C 16/48 (2013.01); C23C 16/56 (2013.01); G03F 1/22 (2013.01); G03F 7/70033 (2013.01); H01L 21/285 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A method of forming a patterned layer of material, the method comprising:
irradiating a selected portion of a surface of a substrate during an atomic layer deposition process, the irradiation being such as to locally drive the deposition process in the selected portion and form a layer of deposited material in a pattern defined by the selected portion and wherein the irradiation to drive the deposition process is performed using electromagnetic radiation having a wavelength of less than 100 nm; and
annealing the deposited material to modify the deposited material.