US 12,325,639 B2
Colloidal silica and production method therefor
Hideki Otsuki, Fukuchiyama (JP); Yoshiki Michiwaki, Fukuchiyama (JP); Yuma Negishi, Fukuchiyama (JP); and Toshiki Chiba, Fukuchiyama (JP)
Assigned to FUSO CHEMICAL CO., LTD., Osaka (JP)
Appl. No. 17/436,335
Filed by FUSO CHEMICAL CO., LTD., Osaka (JP)
PCT Filed Feb. 26, 2020, PCT No. PCT/JP2020/007574
§ 371(c)(1), (2) Date Sep. 3, 2021,
PCT Pub. No. WO2020/179555, PCT Pub. Date Sep. 10, 2020.
Claims priority of application No. 2019-040717 (JP), filed on Mar. 6, 2019.
Prior Publication US 2022/0177318 A1, Jun. 9, 2022
Int. Cl. C01B 33/141 (2006.01)
CPC C01B 33/141 (2013.01) [C01P 2004/64 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A colloidal silica comprising silica particles having a bent structure and/or a branched structure,
wherein
the silica particles have a particle density of 1.95 or more,
the silica particles have a ratio (m/n) of the content of alkoxy groups m (ppm) to the average primary particle size n (nm) of 200 or more, and
the silica particles having a bent structure and/or a branched structure are present in an amount of 15% or more based on the number of particles in a given field of view as observed with a scanning electron microscope at 200,000-times magnification.