| CPC B29C 64/129 (2017.08) [B05D 5/12 (2013.01); B29C 64/291 (2017.08); B33Y 10/00 (2014.12); B33Y 70/10 (2020.01); C08F 2/50 (2013.01); C08F 20/12 (2013.01); C08K 3/041 (2017.05); H01B 1/24 (2013.01); B29K 2033/08 (2013.01); C08K 2201/011 (2013.01)] | 17 Claims |

|
1. A photo-curable composition for use in additive manufacturing, said composition comprising:
a) at least one photocurable monomer or oligomer;
b) a photoinitiator for polymerization of the monomer or oligomer; and,
from 0.01 to 2 wt. %, based on the weight of the composition, of c) at least one CNS-derived material selected from the group consisting of: carbon nanostructures, fragments of carbon nanostructures, fractured carbon nanotubes, elongated CNS strands, dispersed CNSs, and any combination thereof, wherein,
following polymerization, the resulting polymerized composition has a resistivity, as measured by CTM Method 1, no greater than 105 ohm·cm,
the carbon nanostructures or fragments of carbon nanostructures include a plurality of multiwall carbon nanotubes that are crosslinked in a polymeric structure by being branched, interdigitated, entangled and/or sharing common walls,
the fractured carbon nanotubes are derived from the carbon nanostructures and are branched and share common walls with one another, and
elongated CNS strands are derived from the carbon nanostructures and include CNTs that have been displaced linearly with respect to one another, and
the dispersed CNS comprise exfoliated fractured CNTs that do not share common walls with one another.
|