US 12,325,085 B2
Method and system for uniformly irradiating a frame of a processed substrate
Fulvio Mazzamuto, Gennevilliers (FR); Sylvain Perrot, Gennevilliers (FR); Nabil Douri, Gennevilliers (FR); Guillaume Vincent Thebault, Gennevilliers (FR); Karim Mikaël Huet, Gennevilliers (FR); and Guillermo Abraham Gonzalez Trujillo, Gennevilliers (FR)
Assigned to LASER SYSTEMS & SOLUTIONS OF EUROPE, Gennevilliers (FR)
Filed by LASER SYSTEMS & SOLUTIONS OF EUROPE, Gennevilliers (FR)
Filed on Sep. 16, 2021, as Appl. No. 17/476,964.
Claims priority of application No. 20306057 (EP), filed on Sep. 18, 2020.
Prior Publication US 2022/0088714 A1, Mar. 24, 2022
Int. Cl. B23K 26/352 (2014.01); B23K 26/042 (2014.01); B23K 26/06 (2014.01); B23K 101/40 (2006.01); H01L 21/02 (2006.01)
CPC B23K 26/352 (2015.10) [B23K 26/042 (2015.10); B23K 26/0643 (2013.01); H01L 21/02354 (2013.01); B23K 2101/40 (2018.08)] 11 Claims
OG exemplary drawing
 
1. A method for uniformly irradiating a frame of a processed substrate, said processed substrate comprising a plurality of frames, two consecutive frames being separated by an intermediate zone, said method comprises steps of:
determining an initial position of said processed substrate using a detecting unit,
comparing said detected initial position with a first predetermined position associated with a first frame of the processed substrate,
irradiating said first frame of the processed substrate by an irradiation beam emitted by a source unit and scanned by a scanning unit based on the first predetermined position, said irradiation beam being adapted to cover uniformly the whole first frame.