US 12,325,044 B2
Method for protecting air-sensitive or evaporation-sensitive objects
Jean Christophe Gabriel, Quaix-en-Chartreuse (FR); Monika Spano, Charavines (FR); and Fatima-Ezzahra Hami, Grenoble (FR)
Assigned to COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris (FR)
Appl. No. 17/774,582
Filed by COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, Paris (FR)
PCT Filed Nov. 6, 2020, PCT No. PCT/FR2020/052017
§ 371(c)(1), (2) Date May 5, 2022,
PCT Pub. No. WO2021/089957, PCT Pub. Date May 14, 2021.
Claims priority of application No. 1912558 (FR), filed on Nov. 8, 2019.
Prior Publication US 2022/0410204 A1, Dec. 29, 2022
Int. Cl. B05D 1/20 (2006.01); H10K 71/10 (2023.01); H10K 85/00 (2023.01); H10K 85/30 (2023.01); H10K 85/40 (2023.01); H10K 102/00 (2023.01)
CPC B05D 1/204 (2013.01) [H10K 71/10 (2023.02); H10K 85/324 (2023.02); H10K 85/40 (2023.02); H10K 85/701 (2023.02); H10K 2102/00 (2023.02)] 15 Claims
OG exemplary drawing
 
1. A process for depositing a film onto a substrate using a liquid composition, comprising the following steps:
a) formation of a film in the form of a bubble using the liquid composition,
b) placing the film in the form of a bubble in contact with the substrate, and
c) depositing the film in the form of a bubble on the substrate,
wherein the liquid composition comprises a neutral surfactant and a charged lamellar compound, in which the liquid composition is obtained by mixing the charged lamellar compound with the neutral surfactant and the concentration of neutral surfactant before mixing with the charged lamellar compound is less than 0.95 of the critical micelle concentration (CMC) of said surfactant.