CPC H01L 23/53266 (2013.01) [H01L 21/76846 (2013.01); H01L 23/5226 (2013.01); H01L 23/562 (2013.01); H10B 41/27 (2023.02); H10B 41/41 (2023.02)] | 20 Claims |
1. An apparatus, comprising:
one or more insulative materials; and
a conductive contact within a contact via extending through the one or more insulative materials, the conductive contact comprising:
a conductive material adjacent to the one or more insulative materials; and
a dielectric material adjacent to and at least partially surrounded by the conductive material.
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8. An apparatus, comprising:
an insulative material extending through a staircase region and a memory array region adjacent to the staircase region;
conductive contacts extending through the insulative material within the staircase region, the conductive contacts comprising:
a dielectric material; and
a conductive material intervening between the insulative material and the dielectric material, the conductive material at least partially surrounding the dielectric material.
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14. An apparatus, comprising:
conductive contacts within contact vias extending through one or more insulative materials, the conductive contacts comprising a dielectric material and a conductive material interposed between the dielectric material and the one or more insulative materials; and
at least one barrier material comprising a nitride material interposed between the conductive material of the conductive contacts and the one or more insulative materials, the at least one barrier material extending at least partially along a height of the conductive material.
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