CPC H01L 21/76289 (2013.01) [H01L 29/0649 (2013.01)] | 10 Claims |
1. A method for forming an intermetallic air gap, comprising:
S01: forming a trench in a solid dielectric;
S02: preparing an insulating sheet-like two-dimensional material, wherein the insulating sheet-like two-dimensional material comprises an insulating nano sheet-like layer, and the size of the insulating nano sheet-like layer in the sheet-like two-dimensional direction is larger than the size of the trench;
S03: depositing the insulating sheet-shaped two-dimensional material on the solid dielectric and the trench;
S04: annealing the solid dielectric and the insulating sheet-like two-dimensional material to form a stable insulating sheet-like two-dimensional material thin film, thereby forming an intermetallic air gap sealed by the insulating sheet-like two-dimensional material thin film.
|