US 12,002,698 B2
Metrology apparatus and method based on diffraction using oblique illumination and method of manufacturing semiconductor device using the metrology method
Myungjun Lee, Seongnam-si (KR); Changhyeong Yoon, Hwaseong-si (KR); Wookrae Kim, Suwon-si (KR); Jaehwang Jung, Suwon-si (KR); and Jinseob Kim, Incheon (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Feb. 12, 2021, as Appl. No. 17/174,731.
Claims priority of application No. 10-2020-0083129 (KR), filed on Jul. 6, 2020.
Prior Publication US 2022/0005715 A1, Jan. 6, 2022
Int. Cl. H01L 21/67 (2006.01); G01N 21/47 (2006.01); G01N 21/88 (2006.01); G01N 21/95 (2006.01); G06N 20/00 (2019.01)
CPC H01L 21/67288 (2013.01) [G01N 21/4788 (2013.01); G01N 21/8851 (2013.01); G01N 21/9501 (2013.01); G01N 2201/021 (2013.01); G01N 2201/0636 (2013.01); G06N 20/00 (2019.01)] 16 Claims
OG exemplary drawing
 
1. An apparatus comprising:
a light source configured to output a light beam;
a stage on which an object is placed;
a reflective optical element configured to irradiate the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle;
a detector configured to detect a diffracted light beam that is based on the light beam reflected and diffracted by the object;
an angle adjuster; and
a processor configured to measure a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix,
wherein the reflective optical element comprises a magnification reflection type object lens, the magnification reflection type object lens comprising a first aspherical mirror having an opening at a center and a second aspherical mirror provided below the first aspherical mirror,
wherein the light beam passes through the opening of the first aspherical mirror from a first side of the first aspherical mirror, is reflected by the second aspherical mirror, is incident on a second side of the first aspherical mirror different from the first side of the first aspherical mirror, is reflected by the first aspherical mirror, and is incident on the object at the inclination angle, and
wherein the angle adjuster is further configured to adjust the inclination angle to expand a wavelength range of the light beam by changing a focusing position of the light beam on a pupil plane between the first aspherical mirror and the second aspherical mirror, such that sensitivity is maximized for a wavelength used the measurement of the 3D pupil matrix.