US 12,002,692 B2
Operation method of vacuum processing device
Ryoichi Isomura, Tokyo (JP); Keitarou Ogawa, Tokyo (JP); and Takahiro Sakuragi, Tokyo (JP)
Assigned to HITACHI HIGH-TECH CORPORATION, Tokyo (JP)
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
Filed on Oct. 22, 2021, as Appl. No. 17/507,932.
Application 17/507,932 is a continuation of application No. 16/362,002, filed on Mar. 22, 2019, granted, now 11,195,733.
Claims priority of application No. 2018-055589 (JP), filed on Mar. 23, 2018.
Prior Publication US 2022/0051917 A1, Feb. 17, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. H01L 21/67 (2006.01); H01L 21/677 (2006.01)
CPC H01L 21/67184 (2013.01) [H01L 21/67017 (2013.01); H01L 21/67161 (2013.01); H01L 21/67196 (2013.01); H01L 21/67201 (2013.01); H01L 21/67742 (2013.01)] 10 Claims
OG exemplary drawing
 
1. An operation method of a vacuum processing apparatus comprising two vacuum transfer vessels configured to include a transfer chamber in which a wafer which is an object to be processed is transferred in a depressurized inside, and to be disposed side by side in a front and rear direction; an intermediate chamber vessel configured to be disposed to be connected between the two vacuum transfer vessels, and to include an intermediate chamber communicating with each of the two vacuum transfer chambers therein; and a plurality of vacuum processing vessels configured to be connected to each of the two vacuum transfer vessels, and to include a processing chamber in which the wafer is transferred and processed by using plasma therein, which transfers the wafer to each of the plurality of vacuum processing vessels and processes the wafer therein, wherein
each of the two vacuum transfer vessels includes:
a transfer robot configured to transfer the wafer to the inside of each of the vacuum transfer chambers; at least one supply port configured to include an opening on an inner wall of the vacuum transfer chamber behind the transfer robot in the front and rear direction, and to supply a gas toward a center side of the vacuum transfer chamber; and one exhaust port configured to include an opening on an inner wall of the vacuum transfer chamber in front of the transfer robot, and to exhaust the gas, wherein the at least one supply port and the exhaust port are respectively disposed on either right or left side in a front and rear axial direction passing through a center of the intermediate chamber, and
the operation method comprises:
performing a first operation in which, in each of the two vacuum transfer vessels, a gas is supplied between a pair of the at least one supply port and the exhaust port in the front and rear direction among the gas supply ports and the exhaust ports of the two vacuum transfer vessels; and
performing a second operation in which, while the two transfer robots are not in operation, the gas is supplied from the at least one supply port of the one vacuum transfer vessel disposed in rear side of the two vacuum transfer vessels and is introduced, via the intermediate chamber, into the other vacuum transfer vessel disposed in front side of the two vacuum transfer vessels, and the gas is exhausted from the exhaust port of the other two vacuum transfer vessels.