US 12,002,657 B2
Multi-layer plasma resistant coating by atomic layer deposition
Xiaowei Wu, San Jose, CA (US); David Fenwick, Los Altos Hills, CA (US); Jennifer Y. Sun, Mountain View, CA (US); and Guodong Zhan, Woodlands, TX (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 23, 2021, as Appl. No. 17/534,013.
Application 17/534,013 is a division of application No. 16/734,828, filed on Jan. 6, 2020, granted, now 11,251,023.
Application 16/734,828 is a continuation of application No. 15/849,253, filed on Dec. 20, 2017, granted, now 10,573,497, issued on Feb. 25, 2020.
Application 15/849,253 is a continuation of application No. 15/411,892, filed on Jan. 20, 2017, granted, now 10,186,400, issued on Jan. 22, 2018.
Prior Publication US 2022/0157568 A1, May 19, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. B32B 15/04 (2006.01); B32B 17/06 (2006.01); C23C 16/04 (2006.01); C23C 16/06 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01)
CPC H01J 37/32495 (2013.01) [C23C 16/045 (2013.01); C23C 16/06 (2013.01); C23C 16/403 (2013.01); C23C 16/405 (2013.01); C23C 16/4404 (2013.01); C23C 16/45527 (2013.01); C23C 16/45529 (2013.01); C23C 16/45531 (2013.01); C23C 16/45544 (2013.01); C23C 16/45565 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01); H01L 21/67028 (2013.01); H01L 21/67069 (2013.01)] 10 Claims
OG exemplary drawing
 
1. An article comprising:
a body; and
a plasma resistant coating on a surface of at least a portion of the body, wherein the plasma resistant coating comprises:
a stress relief layer having a thickness of about 10 nm to about 1.5 μm; and
a stack of alternating layers of a rare earth metal-containing oxide and a second oxide, the stack of alternating layers comprising:
a plurality of layers of the rare earth metal-containing oxide each having a thickness of about 1 angstrom to about 100 angstroms and having a polycrystalline or amorphous structure; and
a plurality of layers of the second oxide each having a thickness of about 0.5 angstroms to about 4 angstroms,
wherein the rare earth metal-containing oxide naturally occurs in a crystalline structure, wherein the plurality of layers of the second oxide cause the plurality of layers of the rare earth metal-containing oxide to have the polycrystalline or amorphous structure rather than the crystalline structure, and wherein a thickness ratio of the plurality of layers of the rare earth metal-containing oxide to the plurality of layers of the second oxide is 2:1 to 25:1.