US 12,001,624 B2
Input sensing unit and display apparatus including the same
Kiwook Kim, Hwaseong-si (KR); Kwang-Min Kim, Seoul (KR); Yangwan Kim, Hwaseong-si (KR); and Jisu Na, Yongin-si (KR)
Assigned to Samsung Display Co., Ltd., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-si (KR)
Filed on Feb. 6, 2022, as Appl. No. 17/665,582.
Application 17/665,582 is a continuation of application No. 16/556,340, filed on Aug. 30, 2019, granted, now 11,243,624.
Claims priority of application No. 10-2018-0109298 (KR), filed on Sep. 12, 2018; and application No. 10-2018-0129178 (KR), filed on Oct. 26, 2018.
Prior Publication US 2022/0229508 A1, Jul. 21, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G06F 3/041 (2006.01); H10K 59/131 (2023.01); H10K 59/40 (2023.01)
CPC G06F 3/0412 (2013.01) [H10K 59/131 (2023.02); H10K 59/40 (2023.02); G06F 2203/04112 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A display apparatus comprising:
a display unit including pixels and an encapsulation layer covering the pixels and including a first inorganic layer, a second inorganic layer, and an organic layer disposed between the first and second inorganic layers; and
a user input sensing unit including at least one sensing insulating layer disposed on the encapsulation layer, and first to third electrodes insulated from each other;
wherein:
the first electrode includes first main patterns and a first connection pattern disposed on a different layer from the first main patterns and connected to the first main patterns,
the second electrode includes second main patterns each having an opening and insulated from the first main patterns, and a second connection pattern disposed between the second main patterns, and
the third electrode includes third main patterns disposed in corresponding the opening among the openings, and a third connection pattern disposed on the same layer as the first connection pattern and connected to the third main patterns,
at least a portion of the third connection pattern overlaps the second main patterns and one of the first main pattern of the first main patterns on a plane.