US 12,001,139 B2
Resist composition and patterning process
Jun Hatakeyama, Joetsu (JP); and Tomomi Watanabe, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Jul. 21, 2021, as Appl. No. 17/381,405.
Claims priority of application No. 2020-132114 (JP), filed on Aug. 4, 2020; and application No. 2021-041923 (JP), filed on Mar. 16, 2021.
Prior Publication US 2022/0043343 A1, Feb. 10, 2022
Int. Cl. G03F 7/004 (2006.01); C07C 43/29 (2006.01); C07C 43/295 (2006.01); C07C 53/15 (2006.01); C07C 59/115 (2006.01); C07C 63/70 (2006.01); C07C 65/05 (2006.01); C07C 69/63 (2006.01); C07C 205/58 (2006.01); C07C 229/60 (2006.01); C07C 311/09 (2006.01); C07D 205/04 (2006.01); C07D 295/13 (2006.01); C08F 220/18 (2006.01); C08F 220/22 (2006.01); C08F 220/30 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 43/29 (2013.01); C07C 43/295 (2013.01); C07C 53/15 (2013.01); C07C 59/115 (2013.01); C07C 63/70 (2013.01); C07C 65/05 (2013.01); C07C 69/63 (2013.01); C07C 205/58 (2013.01); C07C 229/60 (2013.01); C07C 311/09 (2013.01); C07D 205/04 (2013.01); C07D 295/13 (2013.01); C08F 220/1804 (2020.02); C08F 220/22 (2013.01); C08F 220/30 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A resist composition comprising a base polymer and a quencher,
said quencher comprising a salt compound having the formula (A):

OG Complex Work Unit Chemistry
wherein the ring R is a C2-C12 alicyclic group containing the nitrogen atom, the ring may contain an ether bond, thioether bond, carbonyl group, —N(R′)— or sulfonyl group, R′ is hydrogen, a C1-C6 saturated hydrocarbyl group or -L3-R3,
L1, L2 and L3 are each independently a single bond, ester bond, sulfonyl group, or C1-C6 alkanediyl group, some hydrogen in the alkanediyl group may be substituted by a hydroxy moiety, optionally fluorinated C1-C12 hydrocarbyloxy moiety, or optionally fluorinated C2-C12 hydrocarbylcarbonyloxy moiety, and any methylene constituent in the alkanediyl group may be replaced by an ether bond, ester bond, amide bond, sulfonyl moiety, sulfonate bond, or sulfonamide bond, with the proviso that L1, L2 and L3 do not contain a tertiary ester structure,
R1, R2 and R3 are each independently hydrogen, a C1-C16 saturated hydrocarbyl group, C6-C10 aryl group, C1-C16 saturated hydrocarbyl group substituted with at least three fluorine atoms, C6-C10 aryl group substituted with at least three fluorine atoms, or a combination thereof, one or both of R1 and R2 have at least three fluorine atoms, and
X− is a carboxylate, sulfonamide, halogenated phenoxide or halide anion.