US 12,001,136 B2
Pellicle intermediary body, pellicle, method for manufacturing of pellicle intermediary body, and pellicle manufacturing method
Hidehiko Oku, Azumino (JP); Kei Mihara, Azumino (JP); and Ichiro Hide, Azumino (JP)
Assigned to Air Water Inc., Osaka (JP)
Appl. No. 17/432,852
Filed by AIR WATER INC., Osaka (JP)
PCT Filed Feb. 21, 2020, PCT No. PCT/JP2020/007003
§ 371(c)(1), (2) Date Aug. 20, 2021,
PCT Pub. No. WO2020/175355, PCT Pub. Date Sep. 3, 2020.
Claims priority of application No. 2019-031707 (JP), filed on Feb. 25, 2019.
Prior Publication US 2022/0171279 A1, Jun. 2, 2022
Int. Cl. G03F 1/64 (2012.01); G03F 1/62 (2012.01)
CPC G03F 1/64 (2013.01) [G03F 1/62 (2013.01)] 8 Claims
 
1. A pellicle intermediary body comprising:
a Si substrate,
a Si oxide film formed on a surface of the Si substrate, and
a Si layer formed on a surface of the Si oxide film, wherein
the Si layer includes a low COP (Crystal Originated Particle) portion which is a part where the number of COPs decreases as it approaches the surface of the Si layer and is formed in a part constituting the surface of the Si layer.