US 12,000,047 B2
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
Rachel E. Batzer, Tigard, OR (US); Huatan Qiu, Portland, OR (US); Bhadri N. Varadarajan, Beaverton, OR (US); Patrick Girard Breiling, Tigard, OR (US); Bo Gong, Sherwood, OR (US); Will Schlosser, Tigard, OR (US); Zhe Gui, Beaverton, OR (US); Taide Tan, Tigard, OR (US); and Geoffrey Hohn, Portland, OR (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Filed by Lam Research Corporation, Fremont, CA (US)
Filed on Feb. 2, 2023, as Appl. No. 18/163,828.
Application 16/820,003 is a division of application No. 15/378,854, filed on Dec. 14, 2016, granted, now 10,604,841, issued on Mar. 31, 2020.
Application 18/163,828 is a continuation of application No. 17/401,261, filed on Aug. 12, 2021, granted, now 11,608,559.
Application 17/401,261 is a continuation of application No. 16/820,003, filed on Mar. 16, 2020, granted, now 11,101,164, issued on Aug. 24, 2021.
Prior Publication US 2023/0175134 A1, Jun. 8, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/505 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); B05C 13/02 (2006.01); C23C 16/458 (2006.01)
CPC C23C 16/45565 (2013.01) [C23C 16/45572 (2013.01); C23C 16/505 (2013.01); H01J 37/32082 (2013.01); H01J 37/32357 (2013.01); H01J 37/32422 (2013.01); H01J 37/3244 (2013.01); H01J 37/32522 (2013.01); H01J 37/32715 (2013.01); H01L 21/67011 (2013.01); H01L 21/67017 (2013.01); H01L 21/67207 (2013.01); H01L 21/68735 (2013.01); H01L 21/68742 (2013.01); H01L 21/68757 (2013.01); H01L 21/68785 (2013.01); B05C 13/02 (2013.01); C23C 16/4581 (2013.01); C23C 16/4583 (2013.01); H01J 37/32642 (2013.01); H01J 2237/334 (2013.01); H01L 21/67069 (2013.01); H01L 21/6715 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus for use in processing substrates, the apparatus comprising:
a showerhead formed by a plurality of layers that are bonded together to form a contiguous structure, wherein:
the showerhead includes a plurality of through-holes extending from a top surface of the showerhead to a bottom surface of the showerhead opposite the top surface,
the showerhead includes a secondary gas plenum located in between the top surface of the showerhead and the bottom surface of the showerhead,
a plurality of secondary gas injection ports lead from the secondary gas plenum to the bottom surface of the showerhead,
a cylindrical wall encircles the through-holes and the plurality of secondary gas injection ports, extends from the bottom surface of the showerhead by a first distance, and is offset radially inward from an outer edge of the showerhead.