CPC C23C 16/45565 (2013.01) [C23C 16/45572 (2013.01); C23C 16/505 (2013.01); H01J 37/32082 (2013.01); H01J 37/32357 (2013.01); H01J 37/32422 (2013.01); H01J 37/3244 (2013.01); H01J 37/32522 (2013.01); H01J 37/32715 (2013.01); H01L 21/67011 (2013.01); H01L 21/67017 (2013.01); H01L 21/67207 (2013.01); H01L 21/68735 (2013.01); H01L 21/68742 (2013.01); H01L 21/68757 (2013.01); H01L 21/68785 (2013.01); B05C 13/02 (2013.01); C23C 16/4581 (2013.01); C23C 16/4583 (2013.01); H01J 37/32642 (2013.01); H01J 2237/334 (2013.01); H01L 21/67069 (2013.01); H01L 21/6715 (2013.01)] | 20 Claims |
1. An apparatus for use in processing substrates, the apparatus comprising:
a showerhead formed by a plurality of layers that are bonded together to form a contiguous structure, wherein:
the showerhead includes a plurality of through-holes extending from a top surface of the showerhead to a bottom surface of the showerhead opposite the top surface,
the showerhead includes a secondary gas plenum located in between the top surface of the showerhead and the bottom surface of the showerhead,
a plurality of secondary gas injection ports lead from the secondary gas plenum to the bottom surface of the showerhead,
a cylindrical wall encircles the through-holes and the plurality of secondary gas injection ports, extends from the bottom surface of the showerhead by a first distance, and is offset radially inward from an outer edge of the showerhead.
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