	US 12,000,037 B2
	Area selective nanoscale-thin layer deposition via precise functional group lithography
Matthew R. Maschmann, Columbia, MO (US); and Matthias J. Young, Columbia, MO (US)
Assigned to The Curators of the University of Missouri, Columbia, MO (US)
Filed by The Curators of the University of Missouri, Columbia, MO (US)
Filed on Dec. 23, 2022, as Appl. No. 18/146,043.
Application 18/146,043 is a continuation of application No. 17/387,185, filed on Jul. 28, 2021.
Claims priority of provisional application 63/058,103, filed on Jul. 29, 2020.
Prior Publication US 2023/0132011 A1, Apr. 27, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/02 (2006.01); C23C 16/20 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01)

CPC C23C 16/0263 (2013.01) [C23C 16/20 (2013.01); C23C 16/403 (2013.01); C23C 16/45527 (2013.01)]

19 Claims

1. A method of depositing a nanoscale-thin film in a preselected area on a substrate, the method comprising:

depositing a layer of a functionalizing molecule onto or adjacent to a first surface of the substrate;

functionalizing the first surface of the substrate by focusing a source of ionizing radiation onto the layer of the functionalizing molecule to create a desired pattern of functionality with nano-scale spatial resolution on the substrate;

removing the layer of the functionalizing molecule; and

depositing a nanoscale-thin film onto the functionalized first surface of the substrate to form a deposited nanoscale-thin film.