	US 12,000,035 B2
	Sanitary equipment part
Yui Noda, Kitakyushu (JP); Saori Ukigai, Kitakyushu (JP); and Yuya Suzuki, Kitakyushu (JP)
Assigned to Toto Ltd., Fukuoka (JP)
Appl. No. 17/280,675
Filed by TOTO LTD., Kitakyushu (JP)
PCT Filed Mar. 1, 2021, PCT No. PCT/JP2021/007682 § 371(c)(1), (2) Date Mar. 26, 2021, PCT Pub. No. WO2021/199833, PCT Pub. Date Oct. 7, 2021.
Claims priority of application No. 2020-064495 (JP), filed on Mar. 31, 2020.
Prior Publication US 2023/0017857 A1, Jan. 19, 2023
Int. Cl. B32B 9/00 (2006.01); C23C 14/00 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01); C23C 14/54 (2006.01)

CPC C23C 14/083 (2013.01) [B32B 9/005 (2013.01); C23C 14/0015 (2013.01); C23C 14/34 (2013.01); C23C 14/547 (2013.01)]

18 Claims

1. A part comprising a base material, a colored layer on the base material, and a surface layer on the colored layer, wherein

the colored layer contains Zr and optionally, C and/or N,

a ratio H_{Zr oxide}/H_Zrof a peak height derived from Zr oxide H_{Zr oxide}to a peak height of Zr H_Zrat an interface of the colored layer on the side of the surface layer, in a profile obtained by an XPS depth direction analysis, is more than 0 and less than 4.5, the XPS depth direction analysis being performed under the following XPS measurement conditions and Sputtering conditions 1,

XPS measurement conditions

X-ray condition: monochromatic AlKα ray (output 25 W),

Photoelectron take-off angle: 45°,

Analysis area: 100 μmφ,

Charge neutralizer setting: 1.0 V, 10 μA,

Time per step: 50 ms,

Sweep: five times,

Pass energy: 112 eV, and

Element to be analyzed (energy range): Zr3d (177-187 eV), C1s (281-296 eV), N1s (394-406 eV), O1s (524-540 eV), Cr2p3 (572-582 eV), Ti2p (452-463 eV), Si2p (98-108 eV),

Sputtering conditions 1

Inert gas species: Ar,

Sputtering voltage: 500 V,

Sputtering range: 2 mm*2 mm, and

Sputtering cycle: 10 seconds, and

the ratio H_{Zr oxide}/H_Zrat a point where Ar sputtering is performed for 5 minutes from the interface of the colored layer on the side of the surface layer with an XPS depth direction analysis is between 0 or more and less than 3, the XPS depth direction analysis being performed under said XPS measurement conditions and the following Sputtering conditions 2,

Sputtering conditions 2

Inert gas species: Ar

Sputtering voltage: 500 V

Sputtering range: 2 mm*2 mm

Sputtering cycle: 1 minute; and

the surface layer

is water-repellent, and

includes a hydrophobic group, and

exhibits a sputtering time of 5 minutes or less, the sputtering time being a time taken from the start of the sputtering to an end point of the surface layer, and the end point being defined, in a profile obtained by an XPS depth direction analysis of the surface layer, as a point where an absolute value of a difference between a carbon atom concentration at a certain measurement point and a carbon atom concentration at an immediately previous measurement point to the certain measurement point is 1.0 at % or less, the XPS depth direction analysis being performed under said XPS measurement conditions and said Sputtering conditions 1.