US 12,324,085 B2
Microwave plasma treatment device
Hideaki Yamada, Ikeda (JP); Akiyoshi Chayahara, Ikeda (JP); and Yoshiaki Mokuno, Ikeda (JP)
Assigned to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, Tokyo (JP)
Appl. No. 18/274,422
Filed by NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, Tokyo (JP)
PCT Filed Jan. 25, 2022, PCT No. PCT/JP2022/002724
§ 371(c)(1), (2) Date Jul. 26, 2023,
PCT Pub. No. WO2022/163661, PCT Pub. Date Aug. 4, 2022.
Claims priority of application No. 2021-011549 (JP), filed on Jan. 27, 2021.
Prior Publication US 2024/0098866 A1, Mar. 21, 2024
Int. Cl. H05H 1/00 (2006.01); C23C 16/511 (2006.01); H05H 1/46 (2006.01)
CPC H05H 1/01 (2021.05) [C23C 16/511 (2013.01); H05H 1/4622 (2021.05)] 10 Claims
OG exemplary drawing
 
1. A microwave plasma treatment device comprising:
a resonator including a container;
a single microwave oscillation source configured to output a reference microwave to the resonator;
a waveguide that connects the microwave oscillation source and the resonator to each other; and
a phase control mechanism configured to generate a modified microwave having a phase different from a phase of the reference microwave by controlling a phase of a divided part of the reference microwave,
wherein the resonator includes one or more first-type introducing portions for introducing the reference microwave into the resonator, and one or more second-type introducing portions for introducing the modified microwave into the resonator, and
the microwave plasma treatment device is configured such that at least one of a position, a size, and a shape of a plasma ball generated in the container is changed by superimposing the modified microwave on the reference microwave in the resonator.