| CPC H01L 21/67248 (2013.01) [H01L 21/68714 (2013.01)] | 12 Claims |

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1. A substrate processing system comprising:
a substrate support including N zones and N resistive heaters, respectively, where N is an integer greater than one, and a temperature sensor located in one of the N zones; and
a controller configured to:
calculate N resistances of the N resistive heaters during operation; and
adjust power to N−1 of the N resistive heaters during operation of the substrate processing system in response to:
a temperature measured by the temperature sensor located in the one of the N zones; and
the N resistances of the N resistive heaters.
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