US 12,322,600 B2
Substrate treatment apparatus, substrate treatment method, substrate treatment system, and learning data generation method
Hideji Naohara, Kyoto (JP); Takashi Ota, Kyoto (JP); Takashi Ikeuchi, Kyoto (JP); and Yasunori Nakamura, Kyoto (JP)
Assigned to SCREEN Holdings Co., Ltd., Kyoto (JP)
Filed by SCREEN Holdings Co., Ltd., Kyoto (JP)
Filed on Dec. 24, 2020, as Appl. No. 17/133,674.
Claims priority of application No. 2019-238989 (JP), filed on Dec. 27, 2019; and application No. 2020-194253 (JP), filed on Nov. 24, 2020.
Prior Publication US 2021/0202258 A1, Jul. 1, 2021
Int. Cl. H01L 21/306 (2006.01); G05B 13/04 (2006.01); G05B 23/02 (2006.01); H01L 21/3213 (2006.01)
CPC H01L 21/30604 (2013.01) [G05B 13/04 (2013.01); G05B 23/0243 (2013.01); H01L 21/32134 (2013.01)] 22 Claims
OG exemplary drawing
 
1. A substrate treatment apparatus that supplies a treatment solution to a substrate and executes a treatment on the substrate, the substrate treatment apparatus comprising:
a nozzle that supplies the treatment solution to the substrate;
a moving mechanism that causes at least either the nozzle or the substrate to move;
a storage portion that stores a first learned model; and
a control portion that controls the moving mechanism using the first learned model,
wherein the first learned model is generated by learning, as learning data, learning target speed information indicating at least either a moving speed of the nozzle or a moving speed of a substrate that is a learning target or indicating a relative moving speed of the nozzle and the substrate that is the learning target and an amount of the treatment acquired by executing the treatment on the substrate that is the learning target while causing at least either the nozzle or the substrate that is the learning target to move at a speed based on the learning target speed information,
the amount of the treatment indicates an amount by which the substrate is treated in the treatment,
the control portion causes output of speed information at the time of treatment from the first learned model by inputting a target amount of the amount of the treatment to the first learned model,
the control portion controls the moving mechanism such that at least either the nozzle or a substrate that is a treatment target moves at a speed based on the speed information at the time of treatment when the treatment is executed on the substrate that is the treatment target, and
the speed information at the time of treatment indicates at least either the moving speed of the nozzle or a moving speed of the substrate that is the treatment target or indicates a relative moving speed of the nozzle and the substrate that is the treatment target.