| CPC H01J 37/32834 (2013.01) [C23C 16/4412 (2013.01); C23C 16/45591 (2013.01); C23C 16/52 (2013.01); H01J 37/32633 (2013.01); H01J 37/32651 (2013.01); H01L 21/67017 (2013.01); H01L 21/6719 (2013.01); H01L 21/67393 (2013.01); H01J 2237/3341 (2013.01)] | 15 Claims |

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1. A plasma processing apparatus comprising:
a plurality of plasma processing chambers, each of the plurality of plasma processing chambers having a substrate support;
a plurality of rotor blades and a plurality of stator blades disposed around the substrate support of each of the plurality of plasma processing chambers;
a controller configured to control a rotational speed of the plurality of rotor blades; and
an exhaust space disposed at a bottom of the plurality of plasma processing chambers; and
a turbo molecular pump connected to the plurality of plasma processing chambers,
wherein each of the plurality of plasma processing chambers has a bottom wall and an opening through the bottom wall, and the opening of one of the plurality of plasma processing chambers and the opening of another one of the plurality of plasma processing chambers are contiguous with each other to together form one hole, the bottom wall being situated directly below the plurality of rotor blades and the plurality of stator blades, the opening facing the plurality of rotor blades and the plurality of stator blades in a vertical direction,
wherein the turbo molecular pump is connected to the opening of the bottom wall and situated below the bottom wall, the plurality of rotor blades and the plurality of stator blades being situated above the bottom wall, and
wherein the plurality of stator blades are fixed to walls separating the plasma processing chambers, and the plurality of rotor blades are located further inside than the plurality of stator blades within each of the plasma processing chambers.
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