| CPC G21K 5/04 (2013.01) [H01J 37/147 (2013.01); H01J 37/28 (2013.01); H01J 37/3174 (2013.01); H10N 52/01 (2023.02); H10N 60/01 (2023.02); H10N 60/30 (2023.02); H10N 70/041 (2023.02); H10N 70/257 (2023.02); H01J 2237/004 (2013.01)] | 18 Claims |

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1. A method, comprising:
(a) directing an ultra-low voltage electron beam to a surface of a first insulating layer, the first insulating layer disposed on a second insulating layer, the second insulting layer disposed on silicon; and
(b) modifying, by application of the ultra-low voltage electron beam, the surface of the first insulating layer to selectively switch an interface between a first state having a first electronic property and a second state having a second electronic property, the interface being between the first insulating layer and the second insulating layer.
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