| CPC G11C 16/0483 (2013.01) [H10B 41/10 (2023.02); H10B 41/27 (2023.02); H10B 41/35 (2023.02); H10B 43/10 (2023.02); H10B 43/27 (2023.02); H10B 43/35 (2023.02)] | 41 Claims | 

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               1. A method used in forming a memory array comprising strings of memory cells, comprising: 
            forming memory block regions individually comprising a vertical stack comprising alternating insulative tiers and conductive tiers, channel-material strings extending through the insulative tiers and the conductive tiers, the conductive tiers individually comprising a void-space extending laterally-across individual of the memory-block regions; 
                forming at least one of conductive or semiconductive material in the void-space laterally-outward of individual of the channel-material strings; and 
                forming conductive molybdenum-containing metal material in the void-space directly against the at least one of the conductive or the semiconductive material and forming therefrom a conductive line comprising the conductive molybdenum-containing metal material, the at least one of the conductive or the semiconductive material being of different composition from that of the conductive molybdenum-containing metal material. 
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