| CPC G06T 7/001 (2013.01) [G06T 3/40 (2013.01); H01L 22/12 (2013.01); G06T 2207/20016 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20132 (2013.01); G06T 2207/20224 (2013.01); G06T 2207/30164 (2013.01)] | 21 Claims |

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1. A method for inspecting semiconductor workpieces, the method comprising:
obtaining a workpiece image of a semiconductor workpiece;
providing the workpiece image as input to a machine-learned encoding model;
obtaining an output from the machine-learned encoding model, the output comprising an encoding corresponding to the semiconductor workpiece; and
determining one or more characteristics of the semiconductor workpiece based at least in part on the encoding, the one or more characteristics associated with a crystalline material feature; and
modifying a semiconductor manufacturing process based at least in part on the encoding.
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