US 12,321,092 B2
Pellicle for extreme ultraviolet lithography containing amorphous carbon and method for manufacturing the same
Hyeong Keun Kim, Yongin-si (KR); Seul Gi Kim, Yongin-si (KR); Hyun Mi Kim, Seoul (KR); Jin Woo Cho, Seoul (KR); and Hye Young Kim, Bucheon-si (KR)
Assigned to Korea Electronics Technology Institute, Seongnam-si (KR)
Filed by KOREA ELECTRONICS TECHNOLOGY INSTITUTE, Seongnam-si (KR)
Filed on Mar. 18, 2022, as Appl. No. 17/698,370.
Claims priority of application No. 10-2021-0045881 (KR), filed on Apr. 8, 2021.
Prior Publication US 2022/0326600 A1, Oct. 13, 2022
Int. Cl. G03F 1/62 (2012.01)
CPC G03F 1/62 (2013.01) 14 Claims
 
1. A pellicle for extreme ultraviolet lithography, the pellicle comprising:
a substrate having an opening formed in a central portion;
a support layer formed on the substrate to cover the opening; and
a pellicle layer formed on the support layer and containing amorphous carbon,
the pellicle layer including:
a core layer formed on the support layer; and
a capping layer formed on the core layer and containing the amorphous carbon.