US 12,320,003 B2
Substrate processing apparatus including gas diffusion nozzle
Daiki Nojiri, Tama (JP)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on May 22, 2023, as Appl. No. 18/200,218.
Claims priority of provisional application 63/345,773, filed on May 25, 2022.
Prior Publication US 2023/0383410 A1, Nov. 30, 2023
Int. Cl. C23C 16/513 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01)
CPC C23C 16/513 (2013.01) [C23C 16/45559 (2013.01); C23C 16/458 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A substrate processing apparatus comprising:
a reaction chamber;
a susceptor disposed in the reaction chamber and configured to support a substrate;
a shower plate provided above the susceptor;
a gas transport tube positioned above the shower plate and in fluid communication with the reaction chamber; and
a gas supply tube connected to the gas transport tube through a gas diffusion nozzle,
wherein the gas diffusion nozzle comprises a body having a plurality of holes formed therethrough, the holes extending from a first exterior surface to an opposing second exterior surface, and
wherein at least one of the holes is angled.