US 12,319,638 B1
Hypoallergenic aspartic resin complex and preparation process thereof
Rulong Zheng, Guangdong (CN); Shuying Zheng, Guangdong (CN); Ping Liang, Guangdong (CN); Zhu Chen, Guangdong (CN); Xiaoyong Qiu, Guangdong (CN); and Junle Su, Guangdong (CN)
Assigned to SHENZHEN FEIYANG PROTECH CORP., LTD, Guangdong (CN)
Filed by SHENZHEN FEIYANG PROTECH CORP., LTD, Guangdong (CN)
Filed on Dec. 24, 2024, as Appl. No. 19/000,795.
Claims priority of application No. 202411285484 (CN), filed on Sep. 13, 2024.
Int. Cl. C07C 227/08 (2006.01); C08G 63/685 (2006.01); C08K 5/11 (2006.01); C08K 5/17 (2006.01)
CPC C07C 227/08 (2013.01) [C08G 63/685 (2013.01); C08K 5/11 (2013.01); C08K 5/175 (2013.01)] 9 Claims
 
1. A hypoallergenic aspartic resin complex, comprising the following components:
(A) a polyaspartic resin with a structure represented by formula (1) below,

OG Complex Work Unit Chemistry
wherein R1 and R2 are independently selected from C1-C4-alkyls, X is selected from polyvalent organic structures left after removal of primary amino groups of polyamine compounds, and the polyvalent organic structures have an average molecular weight of 50-5000 and are inert to isocyanate groups at 100° C., and n=2-3;
(B) a monoamine maleate adduct with a structure represented by formula (2) below,

OG Complex Work Unit Chemistry
wherein R3 is selected from organic groups left after removal of one H atom from an amino group in organic amine compounds, the organic amine compounds contain one primary amino group or one secondary amino group and have a molecular weight of not greater than 150, and Et represents ethyl; and
(C) at least one of diethyl fumarate or diethyl maleate, a content of which is not greater than 0.5% by weight in the hypoallergenic aspartic resin complex;
wherein the organic amine compound is one or more of organic amine compounds with a general chemical formula (3) or (4) below;
R4NH2  (3)
wherein R4 is selected from C5-C6-cycloalkyls or C6-C10-substituted cycloalkyls;
R5NHR6  (4)
wherein R5 and R6 are independently selected from C1-C4-alkyls.