US 12,319,049 B2
Deposit levelling
Mark Alfred Whitmore, Broadstone (GB); and Jeffrey David Schake, Apalachin, NY (US)
Assigned to ASMPT SMT SINGAPORE PTE. LTD., Singapore (SG)
Filed by ASMPT SMT Singapore Pte. Ltd., Singapore (SG)
Filed on Nov. 9, 2022, as Appl. No. 17/983,558.
Claims priority of application No. 2116126 (GB), filed on Nov. 10, 2021.
Prior Publication US 2023/0146845 A1, May 11, 2023
Int. Cl. B41F 15/44 (2006.01); B41F 23/04 (2006.01); H01L 23/00 (2006.01)
CPC B41F 15/44 (2013.01) [B41F 23/0456 (2013.01); H01L 24/27 (2013.01); H01L 24/83 (2013.01); H01L 2224/2732 (2013.01); H01L 2224/83192 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A method for producing a flat feature on a substrate, comprising the steps of:
i) printing a deposit of print medium onto the substrate, the printed deposit comprising an upper surface,
ii) modifying the upper surface of the printed deposit, and
iii) levelling the modified deposit to produce a flat feature,
wherein step iii) comprises performing a levelling operation in which a levelling squeegee is moved across a levelling stencil to contact the modified upper surface of the printed deposit.